Pascal and Francis Bibliographic Databases

Help

Export

Selection :

Permanent link
http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=20121106

A study on the wet etching behavior of AZO (ZnO:Al) transparent conducting film

Author
LIN, Y. C1 ; JIAN, Y. C1 ; JIANG, J. H1
[1] Department of Mechatronics Engineering, National Changhua University of Education, Changhua 50007, Taiwan, Province of China
Source

Applied surface science. 2008, Vol 254, Num 9, pp 2671-2677, 7 p ; ref : 13 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
AZO film Chemical stability Transparent conducting film Wet etching
Keyword (fr)
Composé de métal de transition Composé minéral Gravure Oxyde de zinc O Zn ZnO
Keyword (en)
Transition element compounds Inorganic compounds Etching Zinc oxide
Keyword (es)
Zinc óxido
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20121106

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web