Pascal and Francis Bibliographic Databases

Help

Export

Selection :

Permanent link
http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=20256790

Spatial defect pattern recognition on semiconductor wafers using model-based clustering and Bayesian inference

Author
TAO YUAN1 ; KUO, Way2
[1] Department of Industrial and Information Engineering, The University of Tennessee, Knoxville, TN 37996, United States
[2] College of Engineering, The University of Tennessee, 124 Perkins Hall, Knoxville, TN 37996, United States
Source

European journal of operational research. 2008, Vol 190, Num 1, pp 228-240, 13 p ; ref : 3/4 p

CODEN
EJORDT
ISSN
0377-2217
Scientific domain
Control theory, operational research
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Pattern recognition Quality control Semiconductor manufacturing Stochastic processes
Keyword (fr)
Amas Classification Contrôle qualité Défaut Ellipsoïde Estimation Bayes Fabrication microélectronique Fonction potentiel Modélisation Pastille électronique Processus fabrication Processus stochastique Procédé fabrication Reconnaissance forme Semiconducteur
Keyword (en)
Cluster Classification Quality control Defect Ellipsoid Bayes estimation Microelectronic fabrication Potential function Modeling Wafer Production process Stochastic process Manufacturing process Pattern recognition Semiconductor materials
Keyword (es)
Montón Clasificación Control de calidad Defecto Elipsoide Estimación Bayes Fabricación microeléctrica Función potencial Modelización Pastilla electrónica Proceso fabricación Proceso estocástico Procedimiento fabricación Reconocimiento patrón Semiconductor(material)
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D01 Operational research. Management science

Discipline
Operational research. Management
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20256790

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web