A review of molecule-based conductors electrodeposited as thin films on silicon wafers : thin films of molecular organic materials
- Author
- DE CARO, Dominique1 ; MALFANT, I1 ; SAVY, J.-P1 ; VALADE, L1
[1] Laboratoire de Chimie de Coordination (CNRS UPR 8241), 205, route de Narbonne, 31077 Toulouse, France - Source
Journal of physics. Condensed matter (Print). 2008, Vol 20, Num 18 ; 184012.1-184012.10 ; ref : 39 ref
- CODEN
- JCOMEL
- ISSN
- 0953-8984
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Composé du nickel Conducteur organique Conductivité électrique Couche mince Dépôt électrolytique Microscopie électronique balayage Morphologie Mécanisme croissance Nanofil Structure moléculaire
- Keyword (en)
- Nickel compounds Organic conductors Electrical conductivity Thin films Electrodeposition Scanning electron microscopy Morphology Growth mechanism Nanowires Molecular structure
- Keyword (es)
- Mecanismo crecimiento
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07V Quantum wires
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20316089
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0953-8984/20/18/184012 
https://dx.doi.org/10.1088/0953-8984/20/18/184012
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