A novel micromachined shadow mask system with self-alignment and gap control capability
- Author
- JUNG MOO HONG1 ; JUN ZOU1
[1] Department of Electrical and Computer Engineering, Texas A&M University, College Station, TX 77843, United States - Source
Journal of micromechanics and microengineering (Print). 2008, Vol 18, Num 5 ; 055002.1-055002.7 ; ref : 14 ref
- ISSN
- 0960-1317
- Scientific domain
- Electronics; Mechanical engineering
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Acier Alignement Autoalignement Cavité Etude expérimentale Force interatomique Mesure force Microusinage substrat Semiconducteur organique Silicium Transistor couche mince
- Keyword (en)
- Steel Alignment Self alignment Cavity Experimental study Interatomic forces Force measurement Bulk micromachining Organic semiconductors Silicon Thin film transistor
- Keyword (es)
- Acero Alineamiento Autoalineación Cavidad Estudio experimental Medición esfuerzo Micromaquinado substrato Silicio Transistor capa delgada
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G10 Mechanical instruments, equipment and techniques / 001B00G10C Micromechanical devices and systems
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D12 Mechanical engineering. Machine design / 001D12I Precision engineering, watch making
- Discipline
- Electronics Mechanical engineering. Mechanical construction. Handling Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20337545
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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