Morphology effect on the electrochromic and electrochemical performances of NiO thin films
- Author
- XIA, X. H1 ; TU, J. P1 ; ZHANG, J1 ; WANG, X. L1 ; ZHANG, W. K2 ; HUANG, H2
[1] Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
[2] College of Chemical Engineering and Materials Science, Zhejiang University of Technology, Hangzhou 310032, China - Source
Electrochimica acta. 2008, Vol 53, Num 18, pp 5721-5724, 4 p ; ref : 29 ref
- CODEN
- ELCAAV
- ISSN
- 0013-4686
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Author keyword
- NiO thin film;Morphology;Electrochromic;Chemical bath deposition;Sol-gel
- Keyword (fr)
- Caractéristique électrique Couche mince Diffraction RX Dépôt bain chimique Effet structure Electrochromisme Electrode ITO Microscopie électronique balayage Morphologie Nickel Oxyde Procédé sol gel Spectrométrie impédance électrochimique Structure surface
- Keyword (en)
- Electrical characteristic Thin film X ray diffraction Chemical bath deposition Structure effect Electrochromism Indium tin oxide electrode Scanning electron microscopy Morphology Nickel Oxides Sol gel process Electrochemical impedance spectroscopy Surface structure
- Keyword (es)
- Característica eléctrica Capa fina Difracción RX Depósito baño químico Efecto estructura Electrocromismo Electrodo ITO Microscopía electrónica barrido Morfología Niquel Óxido Procedimiento sol gel Estructura superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01H Electrochemistry / 001C01H08 Miscellaneous (electroosmosis, electrophoresis, electrochromism, electrocrystallization, ...)
- Discipline
- General chemistry and physical chemistry
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20351141
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.electacta.2008.03.047 
https://dx.doi.org/10.1016/j.electacta.2008.03.047
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