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Fretting wear behavior of nanocrystalline surface layer of copper under dry condition

Author
ZHANG, Y. S1 ; HAN, Z1 ; LU, K1
[1] Shenyang National Loboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, China
Source

Wear. 2008, Vol 265, Num 3-4, pp 396-401, 6 p ; ref : 17 ref

CODEN
WEARAH
ISSN
0043-1648
Scientific domain
Chemical engineering; Mechanical engineering; Mechanics acoustics; Metallurgy, welding
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Copper Fretting Nanocrystalline metals Surface mechanical attrition treatment (SMAT) Unlubricated friction
Keyword (fr)
Attrition Charge critique Couche oxyde Couche superficielle Cuivre Etude expérimentale Frottement sec Grenaillage Microdéplacement Résistance usure Surface contact Traitement surface Tribologie Usure petit débattement
Keyword (en)
Attrition Critical load Oxide layer Surface layer Copper Experimental study Dry friction Shot peening Microdisplacement Wear resistance Contact surface Surface treatment Tribology Fretting wear
Keyword (es)
Atrición Carga crítica Capa óxido Capa superficial Cobre Estudio experimental Frotamiento seco Granalla Microdesplazamiento Resistencia al desgaste Superficie contacto Tratamiento superficie Tribología Desgate pequinio desplazamiento
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D12 Mechanical engineering. Machine design / 001D12D Machine components / 001D12D02 Friction, wear, lubrication

Discipline
Mechanical engineering. Mechanical construction. Handling
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20354514

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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