A study of diamond film deposition on WC-Co inserts for graphite machining : Effectiveness of SiC interlayers prepared by HFCVD
- Author
- CABRAL, Gil1 ; GÄBLER, Jan2 ; LINDNER, Jörn2 ; GRACIO, Jose1 ; POLINI, Riccardo3
[1] Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal
[2] Fraunhofer-Institut für Schicht-und Oberflächentechnik 1ST, Bienroder Weg 54 E, 38108 Braunschweig, Germany
[3] Università di Roma Tor Vergata, Dipartimento di Scienze e Tecnologie Chimiche, Via della Ricerca scientifica 1, 00133 Roma, Italy - Source
Diamond and related materials. 2008, Vol 17, Num 6, pp 1008-1014, 7 p ; ref : 19 ref
- ISSN
- 0925-9635
- Scientific domain
- Crystallography
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Cutting tools Diamond films Hot Filament CVD Silicon carbide
- Keyword (fr)
- Adhérence Carbure de silicium Carbure de tungstène Carbure fritté Composé intermétallique Couche intermédiaire Couche mince Couche multimoléculaire Diamant synthétique Diffraction RX Dépôt chimique phase vapeur filament chaud Dépôt chimique phase vapeur Frittage Graphite Microscopie électronique transmission Multicouche Outil coupe Propriété mécanique Revêtement Réseau cubique Siliciure de cobalt Tribologie Usure 6855J 6860B 8105U 8115G SiC
- Keyword (en)
- Adhesion Silicon carbide Tungsten carbide Cemented carbides Intermetallic compounds Interlayers Thin films Multilayer Synthetic diamond XRD Hot filament chemical vapor deposition CVD Sintering Graphite Transmission electron microscopy Multilayers Cutting tools Mechanical properties Coatings Cubic lattices Cobalt silicide Tribology Wear
- Keyword (es)
- Silicio carburo Wolframio carburo Carburo sinterizado Capa multimolecular Diamante sintético Depósito químico fase vapor filamento caliente Cobalto siliciuro
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60B Mechanical and acoustical properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20365806
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.diamond.2008.03.017 
https://dx.doi.org/10.1016/j.diamond.2008.03.017
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