Molecular dynamics simulations for nitridation of organic polymer surfaces due to hydrogen-nitrogen ion beam injections

Author

YAMASHIRO, Masashi¹ ; YAMADA, Hideaki² ; HAMAGUCHI, Satoshi¹
[1] Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
[2] Diamond Research Center, National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan

Conference title

Proceedings of the International Symposium on Dry Process - DPS 2006

Conference name

International Symposium on Dry Process - DPS 2006 (Nagoya 2006-11-29)

Author (monograph)

STAMATE, E (Editor)¹ ; ONO, K (Editor)² ; SHIRATANI, M (Editor)³ ; ECONOMOU, D. J (Editor)⁴ ; CHANG, J. P (Editor)⁵ ; KUSANO, E (Editor)⁶ ; LEE, N.-E (Editor)⁷ ; LEE, J. K (Editor)⁸ ; FUJIWARA, N (Editor)⁹
The Institute of Electrical Engineers of Japan, Japan (Organiser of meeting)
The Japan Society of Applied Physics, Japan (Organiser of meeting)
[1] Risø - Technical University of Denmark, Denmark
[2] Kyoto University, Japan
[3] Kyushu University, Japan
[4] University of Houston, United States
[5] University of California at Los Angeles, United States
[6] Kanazawa Institute of Technology, Japan
[7] SungKyunKwan University, Japan
[8] Pohang University of Science and Technology, Japan
[9] Renesas Technology Corporation, Japan

Source

Thin solid films. 2008, Vol 516, Num 11, pp 3449-3453, 5 p ; ref : 10 ref

CODEN

THSFAP

ISSN

0040-6090

Scientific domain

Crystallography; Electronics; Metallurgy, welding; Condensed state physics

Publisher

Elsevier Science, Lausanne

Publication country

Switzerland

Document type

Conference Paper

Language

English

Author keyword

Carbon nitride Etching Molecular dynamics simulation Nitridation Organic polymer Sputtering

Keyword (fr)

Ammoniac Couche mince Dépôt pulvérisation Etude théorique Faisceau atomique Faisceau ion Gravure ionique réactive Gravure plasma Liaison simple Méthode dynamique moléculaire Nitruration ionique Nitruration Nitrure de carbone Phénylène dérivé polymère Polymère organique Pulvérisation irradiation Simulation numérique Traitement surface 5277B 8115C NH3

Keyword (en)

Ammonia Thin films Sputter deposition Theoretical study Atomic beams Ion beams Reactive ion etching Plasma etching Single bond Molecular dynamics method Ion nitriding Nitridation Carbon nitrides Phenylene derivative polymer Organic polymers Sputtering Digital simulation Surface treatments

Keyword (es)

Grabado iónico reactivo Grabado plasma Enlace simple Nitruración iónica Fenileno derivado polímero

Classification

Pascal

001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77B Etching and cleaning

Pascal

001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Discipline

Physics and materials science Physics of gases, plasmas and electric discharges

Origin

Inist-CNRS

Database

PASCAL

INIST identifier

20373353

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS