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Dislocation-Driven Nanowire Growth and Eshelby Twist

Author
BIERMAN, Matthew J1 ; LAU, Y. K. Albert1 ; KVIT, Alexander V2 ; SCHMITT, Andrew L1 ; SONG JIN1
[1] Department of Chemistry, University of Wisconsin-Madison, 1101 University Avenue, Madison, WI 53706, United States
[2] Materials Science Center, University of Wisconsin-Madison, 1509 University Avenue, Madison, WI 53706, United States
Source

Science (Washington, D.C.). 2008, Vol 320, Num 5879, pp 1060-1063, 4 p

CODEN
SCIEAS
ISSN
0036-8075
Scientific domain
Multidisciplinary
Publisher
American Association for the Advancement of Science, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Dislocation vis Dépôt chimique phase vapeur Joint torsion Microscopie électronique balayage Microscopie électronique transmission Mécanisme croissance Méthode VLS Nanofil Sulfure de plomb Vecteur Burgers
Keyword (en)
Screw dislocations CVD Twist boundaries Scanning electron microscopy Transmission electron microscopy Growth mechanism VLS growth Nanowires Lead sulfide Burgers vector
Keyword (es)
Mecanismo crecimiento Método VLS Plomo sulfuro
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07V Quantum wires

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20380871

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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