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Advanced indium-tin oxide ceramics for sputtering targets

Author
MEDVEDOVSKI, E1 ; ALVAREZ, N1 ; YANKOV, O1 ; OLSSON, M. K2
[1] Umicore Indium Products, 50 Sims Ave, Providence, RI 02909, United States
[2] Umicore Materials AG, Altelandstrasse 8, 9496 Bakers, Liechtenstein
Source

Ceramics international. 2008, Vol 34, Num 5, pp 1173-1182, 10 p ; ref : 19 ref

ISSN
0272-8842
Scientific domain
Chemical industry parachemical industry
Publisher
Elsevier Science, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Addition étain Cible Conductivité électrique Céramique oxyde Céramique électronique Diffraction RX Dopage Etain Oxyde Etude expérimentale Fabrication Frittage Indium Oxyde Microscopie électronique balayage Microstructure Propriété électrique Pulvérisation cathodique In2O3(SnO2)
Keyword (en)
Tin addition Target Electrical conductivity Oxide ceramics Electroceramics X ray diffraction Doping Tin Oxides Experimental study Manufacturing Sintering Indium Oxides Scanning electron microscopy Microstructure Electrical properties Cathodic sputtering
Keyword (es)
Adición estaño Blanco Conductividad eléctrica Cerámica óxido Cerámica electrónica Difracción RX Doping Estaño Óxido Estudio experimental Fabricación Sinterización Indio Óxido Microscopía electrónica barrido Microestructura Propiedad eléctrica Pulverización catódica
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D08 Chemical industry and chemicals / 001D08B Building materials. Ceramics. Glasses / 001D08B04 Ceramic industries / 001D08B04C Technical ceramics / 001D08B04C2 Electrotechnical and electronic ceramics

Discipline
Chemical and parachemical industries
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20381019

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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