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A study of thermo-mechanical stress and its impact on through-silicon vias

Author
RANGANATHAN, N1 2 ; PRASAD, K3 ; BALASUBRAMANIAN, N1 ; PEY, K. L2
[1] Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research), 11 Science Park Road, Singapore Science Park II, 117685 Singapore, Singapore
[2] Division of Microelectronics, School of Electrical & Electronic Engineering, Nanyang Technological University, 639798 Singapore, Singapore
[3] Department of Electrical & Electronic Engineering, Auckland University of Technology, Private Bag 92006, Auckland 1142, New Zealand
Source

Journal of micromechanics and microengineering (Print). 2008, Vol 18, Num 7 ; 075018.1-075018.13 ; ref : 26 ref

ISSN
0960-1317
Scientific domain
Electronics; Mechanical engineering
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Connexion électrique Contrainte thermique Courant fuite Dispositif microélectromécanique Encapsulation Etude expérimentale Perte diélectrique Propriété thermomécanique Rugosité Silicium Surface rugueuse Transducteur interdigital Trou interconnexion
Keyword (en)
Electrical connection Thermal stresses Leakage currents Microelectromechanical device Encapsulation Experimental study Dielectric losses Thermomechanical properties Roughness Silicon Rough surfaces Interdigital transducers Via hole
Keyword (es)
Conexión eléctrica Dispositivo microelectromecánico Propriedad termomecánica Agujero interconexión
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G10 Mechanical instruments, equipment and techniques / 001B00G10C Micromechanical devices and systems

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D12 Mechanical engineering. Machine design / 001D12I Precision engineering, watch making

Discipline
Mechanical engineering. Mechanical construction. Handling Metrology
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20501422

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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