The Relaxed State in a Semicrystalline Polymer : Experimental Characterization and Modeling
- Author
- ROGUET, E1 ; CASTAGNET, S1 ; GRANDIDIER, J. C1
[1] Laboratory of Mechanics and Physics of Materials (UMR CNRS 6617), 1 Avenue Clément Ader, BP 40109, 86961 Futuroscope, France - Conference title
- Structure-Sensitive Mechanics of Polymer Materials: Physical and Mechanical Aspects
- Conference name
- International Colloquium Structure-Sensitive Mechanics of Polymer Materials: Physical and Mechanical Aspects (Strasbourg 2006-10-10)
- Author (monograph)
- PATLAZHAN, S. A (Editor); REMOND, Y (Editor)
European EUROMECH Mechanics Society, Europe (Organiser of meeting) - Source
Polymer science. Series A. 2008, Vol 50, Num 5, pp 514-522, 9 p ; ref : 23 ref
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- Springer, Heidelberg
- Publication country
- Germany
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- A chaud Amide 11 polymère Contrainte traction Courbe fluage Etude expérimentale Modélisation Polymère semicristallin Relation contrainte déformation Relaxation contrainte Sensibilité vitesse déformation Propriété mécanique
- Keyword (en)
- Hot process Amide 11 polymer Tensile stress Creep curve Experimental study Modeling Semicrystalline polymer Stress strain relation Stress relaxation Strain rate sensitivity Mechanical properties
- Keyword (es)
- En caliente Amida 11 polímero Tensión traccíon Curva fluencia Estudio experimental Modelización Polímero semicristalino Relación tensión deformación Relajación tensión Sensibilidad velocidad deformación Propiedad mecánica
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D04 Properties and characterization / 001D09D04B Mechanical properties
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20515592
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1134/S0965545X08050052 
https://dx.doi.org/10.1134/S0965545X08050052
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