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Real-time trace ambient ammonia monitor for haze prevention

Author
NISHIMURA, Katsumi1 ; SAKAGUCHI, Yuhei1 ; CROSSON, Eric2 ; WAHL, Edward2 ; RELLA, Chris2
[1] Horiba, Ltd, Japan
[2] Picarro, Inc, United States
Conference title
Photomask and next-generation lithography mask technology XIV (17-19 April 2007, Yokohama, Japan)
Conference name
Photomask and next-generation lithography mask technology. Conference (Yokohama 2007)
Author (monograph)
Watanabe, Hidehiro (Editor)
Photomask Japan, Japan (Organiser of meeting)
BACUS, Technical group (Organiser of meeting)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66071Y.1-66071Y.11

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6745-4
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Cavité Chromatographie ionique Circuit intégré Durabilité Endommagement Etude comparative Evaluation performance Fabrication microélectronique Fiabilité Haute résolution Industrie électronique Ligne de base Limite résolution Lithographie Pastille électronique Photolithographie Polissage mécanochimique Revêtement Salle blanche Surface optique
Keyword (en)
Cavity Ion chromatography Integrated circuit Durability Damaging Comparative study Performance evaluation Microelectronic fabrication Reliability High resolution Electronics industry Baseline Resolving power Lithography Wafer Photolithography Chemical mechanical polishing Coatings Clean room Optical surface
Keyword (es)
Cavidad Cromatografía iónica Circuito integrado Durabilidad Deterioración Estudio comparativo Evaluación prestación Fabricación microeléctrica Fiabilidad Alta resolucion Industria electrónica Línea de base Poder resolución Litografía Pastilla electrónica Fotolitografía Revestimiento Sala blanca Superficie óptica
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03A General (including economical and industrial fields)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20546172

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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