Advanced tungsten plug process for beyond nanometer technology
- Author
- LUOH, Tuung1 ; SU, Chin-Ta1 ; YANG, Ta-Hung1 ; CHEN, Kuang-Chao1 ; LU, Chih-Yuan1
[1] Technology Development Center, Macronix International Co. Ltd., No. 16, Li-Hsin Road, Science-Based Industrial Park, Hsinchu, Taiwan, Province of China - Source
Microelectronic engineering. 2008, Vol 85, Num 8, pp 1739-1747, 9 p ; ref : 21 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Tungsten plug;Atomic layer deposition;High aspect ratio;Contact size;Tungsten nucleation layer;Resistivity;Grain size
- Keyword (fr)
- Caractéristique électrique Conditions opératoires Croissance grain Damasquinage Dépôt chimique phase vapeur Fabrication microélectronique Grosseur grain Microscopie électronique transmission Méthode MOCVD Méthode couche atomique Nucléation Polissage mécanochimique Résistance contact Résistance électrique
- Keyword (en)
- Electrical characteristic Process conditions Grain growth Damascene process Chemical vapor deposition Microelectronic fabrication Grain size Transmission electron microscopy MOCVD Atomic layer method Nucleation Chemical mechanical polishing Contact resistance Resistor
- Keyword (es)
- Característica eléctrica Condiciones operatorias Crecimiento grano Damasquinado Depósito químico fase vapor Fabricación microeléctrica Grosor grano Microscopía electrónica transmisión Método capa atómica Nucleación Resistencia contacto Resistencia eléctrica(componente)
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03D Electronic equipment and fabrication. Passive components, printed wiring boards, connectics
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20560924
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2008.04.030 
https://dx.doi.org/10.1016/j.mee.2008.04.030
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