Fabrication of 50 nm period gratings with multilevel interference lithography
- Author
- CHANG, Chih-Hao1 ; ZHAO, Y1 ; HEILMANN, R. K1 ; SCHATTENBURG, M. L1
[1] Space Nanotechnology Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States - Source
Optics letters. 2008, Vol 33, Num 14, pp 1572-1574, 3 p ; ref : 17 ref
- CODEN
- OPLEDP
- ISSN
- 0146-9592
- Scientific domain
- Electronics; Optics; Telecommunications
- Publisher
- Optical Society of America, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Etude expérimentale Lithographie Nanostructure Procédé fabrication Réseau diffraction 4279D 8116N Nanolithographie
- Keyword (en)
- Experimental study Lithography Nanostructures Manufacturing processes Diffraction gratings Nanolithography
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B79 Optical elements, devices, and systems / 001B40B79D Gratings
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16N Nanolithography
- Discipline
- Physics : optics Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20562753
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1364/OL.33.001572 
https://dx.doi.org/10.1364/OL.33.001572
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