The advanced mask CD MTT control using dry etch process for sub 65 nm tech
- Author
- SANG JIN JO1 ; HO YONG JUNG1 ; DONG WOOK LEE1 ; JAE CHEON SHIN1 ; JEA YOUNG JUN1 ; TAE JOONG HA1 ; HAN, Oscar1
[1] R&D Division, Hynix Semiconductor Inc. 1 Hyangjeong-dong, Hungduk-gu Cheongju-si 361-725, Korea, Republic of - Conference title
- Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)
- Conference name
- Photomask technology. Conference (Monterey CA 2007)
- Author (monograph)
- Naber, Robert J (Editor); Kawahira, Hiroichi (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673008.1-673008.8 ; ref : 3 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6887-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Commande processus Correction erreur Fabrication microélectronique Fiabilité Lithographie Masque déphasage Photolithographie Procédé voie sèche Résist Taille critique
- Keyword (en)
- Process control Error correction Microelectronic fabrication Reliability Lithography Phase shifting masks Photolithography Dry process Resist Critical size
- Keyword (es)
- Control proceso Corrección error Fabricación microeléctrica Fiabilidad Litografía Fotolitografía Procedimiento vía seca Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20566129
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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