Integrated photomask defect printability check, mask repair and repair validation procedure for phase-shifting masks for the 45nm node and beyond
- Author
- EHRLICH, Christian1 ; BUTTGEREIT, Ute1 ; BOEHM, Klaus1 ; SCHERUEB, Thomas2 ; EDINGER, Klaus2 ; BRET, Tristan2
[1] Carl Zeiss SMS GmbH, Carl Zeiss Promenade 10, 07745 Jena, Germany
[2] Nawotec GmbH -a Carl Zeiss SMS GmbH company - Conference title
- Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)
- Conference name
- Photomask technology. Conference (Monterey CA 2007)
- Author (monograph)
- Naber, Robert J (Editor); Kawahira, Hiroichi (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67301Z.1-67301Z.8 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6887-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Caractérisation défaut Coût production Dimension défaut Fabrication microélectronique Faisceau électronique Forme tridimensionnelle Haute résolution Imprimabilité Lithographie Masque déphasage Microscopie électronique Miniaturisation Méthode double exposition Méthode immersion Photolithographie Résolution spatiale Détection défaut
- Keyword (en)
- Defect characterization Production cost Defect size Microelectronic fabrication Electron beam Three dimensional shape High resolution Printability Lithography Phase shifting masks Electron microscopy Miniaturization Double exposure method Immersion method Photolithography Spatial resolution Defect detection
- Keyword (es)
- Caracterización defecto Coste producción Dimensión imperfección Fabricación microeléctrica Haz electrónico Forma tridimensional Alta resolucion Imprimibilidad Litografía Microscopía electrónica Miniaturización Método doble exposición Método immersión Fotolitografía Resolución espacial Detección imperfección
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20566189
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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