The cleaning effects of mask aerial image after FIB repair in sub-80nm node
- Author
- LEE, Hyemi1 ; JEONG, Goomin1 ; JEONG, Sookyeong1 ; KIM, Sangchul1 ; HAN, Oscar1
[1] MASK Development Team, R&D Division, Hynix Semiconductor Inc. 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si, 361-725, Korea, Republic of - Conference title
- Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)
- Conference name
- Photomask technology. Conference (Monterey CA 2007)
- Author (monograph)
- Naber, Robert J (Editor); Kawahira, Hiroichi (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673022.1-673022.9 ; ref : 5 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6887-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Caractérisation défaut Circuit intégré Dimension défaut Endommagement Fabrication microélectronique Faisceau électronique Imprimabilité Microusinage Mémoire accès direct dynamique Mémoire accès direct Nettoyage chimique Optimisation Pastille électronique Scanneur image Technologie faisceau ion focalisé Détection défaut
- Keyword (en)
- Defect characterization Integrated circuit Defect size Damaging Microelectronic fabrication Electron beam Printability Micromachining Dynamic random access memory Random access memory Chemical cleaning Optimization Wafer Image scanners Focused ion beam technology Defect detection
- Keyword (es)
- Caracterización defecto Circuito integrado Dimensión imperfección Deterioración Fabricación microeléctrica Haz electrónico Imprimibilidad Micromaquinado Memoria acceso directo Limpieza química Optimización Pastilla electrónica Detección imperfección
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06B Integrated circuits by function (including memories and processors)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20566190
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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