More robust Model built using SEM Calibration
- Author
- WANG, Ching-Heng1 ; QINGWEI LIU1 ; LIGUO ZHANG2
[1] Semiconductor Manufacturing International Corp, China
[2] Mentor Graphics Corp, China - Conference title
- Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)
- Conference name
- Photomask technology. Conference (Monterey CA 2007)
- Author (monograph)
- Naber, Robert J (Editor); Kawahira, Hiroichi (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673053.1-673053.7 ; ref : 3 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6887-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Circuit intégré Correction optique de proximité Détection contour Microscopie électronique balayage Modélisation Pastille électronique Représentation graphique Taille critique 0779
- Keyword (en)
- Integrated circuit Optical proximity correction Edge detection Scanning electron microscopy Modeling Wafer Graphics Critical size
- Keyword (es)
- Circuito integrado Corrección de proximidad óptica Detección contorno Microscopía electrónica barrido Modelización Pastilla electrónica Grafo (curva)
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20566303
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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