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MOCVD growth and annealing characteristics of Mg-doped AlGaN films

Author
YAO, J1 ; HAN, P1 ; ZHENG, Y. D1 ; XIE, Z. L1 ; LIU, B1 ; ZHANG, R1 ; JIANG, R. L1 ; LIU, Q. J1 ; XU, F1 ; GONG, H. M2 ; SHI, Y1
[1] Jiangsu Provincial Key Lab of Advanced Photonic and Electronic Materials, Department of Physics, Nanjing University, Nanjing, 210093, China
[2] Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200080, China
Conference title
Sixth International Conference on Thin Film Physics and Applications (25-28 September 2007, Shanghai, China)
Conference name
International Conference on Thin Film Physics and Applications (6 ; Shanghai 2007)
Author (monograph)
Shen, Wenzhong (Editor); Chu, Junhao (Editor)
Shanghai jiao tong da xue, Department of Physics, China (Organiser of meeting)
Society of photo-optical instrumentation engineers, China (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2008 ; 1Vol, pp 69842N.1-69842N.4 ; ref : 8 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-7182-6
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics; Physics
Publisher
SPIE, Bellingham, Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Aluminium Nitrure Couche mince Dopage Etude expérimentale Mécanisme croissance Méthode MOCVD Recuit 0130C 6855A 68 8115G Al Ga N AlGaN
Keyword (en)
Aluminium Nitrides Thin films Doping Experimental study Growth mechanism MOCVD Annealing
Keyword (es)
Doping Mecanismo crecimiento
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15A Theory and models of film growth

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties Theoretical physics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20566388

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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