Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR
- Author
- SIER, Jean-Paul1 ; BROADBENT, William1 ; YU, Paul1
[1] KLA-Tencor Corp., 160 Rio Robles, San Jose, CA, 95134-1809, United States - Conference title
- EMLC 2008 (24th European Mask and Lithography Conference)
- Conference name
- European Mask and Lithography Conference (24 ; Dresden 2008)
- Author (monograph)
- Behringer, Uwe F.W (Editor); Maurer, Wilhelm (Editor); Waelpoel, Jacques (Editor)
VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik, Germany (Organiser of meeting)
BACUS, Technical group (Organiser of meeting)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 67920I.1-67920I.13 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6956-4
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Fabrication microélectronique Lithographie Masque
- Keyword (en)
- Microelectronic fabrication Lithography Mask
- Keyword (es)
- Fabricación microeléctrica Litografía Máscara
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20620784
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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