In-situ polarimetry of illumination for 193-nm lithography
- Author
- NOMURA, Hiroshi1 ; FURUTONO, Yohko1
[1] Semiconductor Company, Toshiba Corporation 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan - Conference title
- Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)
- Conference name
- Optical microlithography (21 ; San Jose CA 2008)
- Author (monograph)
- Levinson, Harry J (Editor); Dusa, Mircea V (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
International SEMATECH, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241T.1-69241T.12 ; ref : 14 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-7109-3
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Angle incidence Couche mince Détecteur image Eclairement Ellipsométrie Fabrication microélectronique In situ Lame quart onde Lithographie UV Lumière réfléchie Mesure épaisseur Méthode immersion Ouverture numérique Paramètre Stokes Pastille électronique Photolithographie Polarimètre Polarimétrie Polariseur Rayonnement UV extrême Scanneur
- Keyword (en)
- Angle of incidence Thin film Image sensor Illumination Ellipsometry Microelectronic fabrication In situ Quarter wave plate UV lithography Reflected light Thickness measurement Immersion method Numerical aperture Stokes parameter Wafer Photolithography Polarimeter Polarimetry Polarizer Vacuum ultraviolet radiation Scanner
- Keyword (es)
- Angulo incidente Capa fina Detector imagen Alumbrado Elipsometría Fabricación microeléctrica In situ Placa cuarto onda Litografía UV Luz reflejada Medición espesor Método immersión Abertura numérica Parámetro Stokes Pastilla electrónica Fotolitografía Polarímetro Polarimetría Polarizador Radiación ultravioleta extrema Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20650930
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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