Multi-Patterning Overlay Control
- Author
- AUSSCHNITT, C. P1 ; DASARI, P2
[1] IBM Microelectronics Division
[2] Nanometrics, Inc - Conference title
- Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)
- Conference name
- Optical microlithography (21 ; San Jose CA 2008)
- Author (monograph)
- Levinson, Harry J (Editor); Dusa, Mircea V (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
International SEMATECH, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692448.1-692448.5 ; ref : 5 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-7109-3
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Echantillonnage Fabrication microélectronique Lithographie Méthode mesure Photolithographie
- Keyword (en)
- Sampling Microelectronic fabrication Lithography Measurement method Photolithography
- Keyword (es)
- Muestreo Fabricación microeléctrica Litografía Método medida Fotolitografía
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20651012
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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