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Author
GOODWIN, William1 ; WELCH, Matt1 ; LAQUIDARA, Bruce1 ; KISHKOVICL, Olee1 ; HABECKER, A2
[1] Entegris Inc
[2] Dynamic Micro Systems
Conference title
Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)
Conference name
Optical microlithography (21 ; San Jose CA 2008)
Author (monograph)
Levinson, Harry J (Editor); Dusa, Mircea V (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
International SEMATECH, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244N.1-69244N.10 ; ref : 5 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-7109-3
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Fabrication microélectronique Masque Mesure débit écoulement Modification chimique Méthode mesure Photolithographie
Keyword (en)
Microelectronic fabrication Mask Flow measurement Chemical modification Measurement method Photolithography
Keyword (es)
Fabricación microeléctrica Máscara Medida caudal flujo Modificación química Método medida Fotolitografía
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20651026

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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