Intensity Weighed Focus Drilling Exposure for Maximizing Process Window of Sub-100nm Contact by Simulation
- Author
- JUNE, Sunwook1 ; YANG, Tien-Chu1 ; YANG, Ta-Hung1 ; CHEN, Kuang-Chao1 ; LU, Chih-Yuan1
[1] Macronix International Co. Ltd, No. 16, Li-Hsin Rd., Science Park, Hsinchu 300, Taiwan, Province of China - Conference title
- Optical microlithography XX (27 February-2 March 2007, San Jose, California, USA)
- Conference name
- Optical microlithography (20 ; San Jose CA 2007)
- Author (monograph)
- Flagello, Donis G (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
International SEMATECH, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65202C.1-65202C.8 ; ref : 3 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6639-6
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Eclairement Evaluation performance Fabrication microélectronique Haute fréquence Haute résolution Photolithographie Plan focal Scanneur
- Keyword (en)
- Illumination Performance evaluation Microelectronic fabrication High frequency High resolution Photolithography Focal plane Scanner
- Keyword (es)
- Alumbrado Evaluación prestación Fabricación microeléctrica Alta frecuencia Alta resolucion Fotolitografía Plano focal Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20651329
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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