Modular process modeling for OPC
- Author
- KECK, M. C1 ; BODENDORF, C1 ; SCHMIDTLING, T1 ; SCHLIEF, R2 ; WILDFEUER, R3 ; ZUMPE, S3 ; NIEHOFF, M4
[1] Qimonda AG, Am Campeon 1-12, 85579 Neubiberg, Germany
[2] Qimonda NA, MS 53512, 3000 CentreGreen Way, Cary, NC, 27513, United States
[3] Qimonda GmbH & Co. OHG, Koenigsbruecker Strasse 180, 01099 Dresden, Germany
[4] Mentor Graphics Corporation, Arnulfstrasse 201, 80634 Munich, Germany - Conference title
- Optical microlithography XX (27 February-2 March 2007, San Jose, California, USA)
- Conference name
- Optical microlithography (20 ; San Jose CA 2007)
- Author (monograph)
- Flagello, Donis G (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
International SEMATECH, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652044.1-652044.9 ; ref : 9 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-6639-6
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Conditions opératoires Correction optique de proximité Fabrication microélectronique Modèle empirique Modélisation Méthode semiempirique Optimisation Photolithographie Résist
- Keyword (en)
- Process conditions Optical proximity correction Microelectronic fabrication Empirical model Modeling Semiempirical method Optimization Photolithography Resist
- Keyword (es)
- Condiciones operatorias Corrección de proximidad óptica Fabricación microeléctrica Modelo empírico Modelización Método semiempírico Optimización Fotolitografía Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20651575
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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