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A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films

Author
BARRECA, Davide1 ; GASPAROTTO, Alberto2 ; MACCATO, Chiara2 ; TONDELLO, Eugenio2 ; ROSSETTO, Gilberto3
[1] ISTM-CNR and INSTM, Department of Chemistry, Padova University, Via Marzolo, 1, 35131 Padova, Italy
[2] Department of Chemistry, Padova University and INSTM, Via Marzolo, 1, 35131 Padova, Italy
[3] ICIS-CNR, Corso Stati Uniti, 4, 35127 Padova, Italy
Source

Thin solid films. 2008, Vol 516, Num 21, pp 7393-7399, 7 p ; ref : 34 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Fourier transformed infrared spectroscopy Hardness Laser reflection interferometry Plasma-enhanced chemical vapor deposition Silicon dioxide Thin films
Keyword (fr)
Composition chimique Couche mince Diffraction RX Dureté Empreinte dureté Essai dureté Interférométrie optique Liaison matériau Matériau transparent Microscopie force atomique Morphologie Mécanisme croissance Méthode PECVD Nanodureté Nanoindentation Optimisation Oxyde de silicium Propriété mécanique Propriété optique Précurseur Revêtement Silice Silicium Spectre UV visible Spectre photoélectron RX Spectrométrie laser Spectrométrie transformée Fourier Temps réel Température ambiante Traitement surface 6855A 6855J 6855N 8115G Application technologique GaIn Si SiO2
Keyword (en)
Chemical composition Thin films XRD Hardness Hardness indentation Hardness testing Light interferometry Bonding Transparent material Atomic force microscopy Morphology Growth mechanism PECVD Nanohardness Nanoindentation Optimization Silicon oxides Mechanical properties Optical properties Precursor Coatings Silica Silicon Ultraviolet visible spectrum X-ray photoelectron spectra Laser spectroscopy Fourier transform spectroscopy Real time Ambient temperature Surface treatments Technological application
Keyword (es)
Indentación dureza Material transparente Mecanismo crecimiento Nanodureza Nanoindentacion Espectro UV visible Tiempo real
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55N Composition and phase identification

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15A Theory and models of film growth

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20662893

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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