Friction Modeling in Linear Chemical-Mechanical Planarization
- Author
- JINGANG YI1
[1] Rutgers University, United States - Source
IEEE control systems. 2008, Vol 28, Num 5, pp 59-78, 20 p ; ref : 27 ref
- ISSN
- 1066-033X
- Scientific domain
- Control theory, operational research; Electronics; Electrical engineering
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Frottement Modélisation Planarisation Polissage chimique Polissage mécanique
- Keyword (en)
- Friction Modeling Planarization Chemical polishing Mechanical polishing
- Keyword (es)
- Frotamiento Modelización Planarización Pulido químico Pulido mecánico
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D12 Mechanical engineering. Machine design / 001D12I Precision engineering, watch making
- Discipline
- Mechanical engineering. Mechanical construction. Handling
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20665709
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1109/MCS.2008.927333 
https://dx.doi.org/10.1109/MCS.2008.927333
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