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Molecular glass photoresists based on acidolysis of acetal compounds

Author
LIYUAN WANG1 ; XIAOXIAO ZHAI1 ; NA XU1
[1] College of Chemistry, Beijing Normal University, Beijing 100875, China
Conference title
Advances in resist materials and processing technology XXV (25-27 February 2008, San Jose, California, USA)
Conference name
Advances in resist materials and processing technologies (25 ; San Jose CA 2008)
Author (monograph)
Henderson, Clifford L (Editor)
SPIE, United States (Organiser of meeting)
International SEMATECH (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231K.1-69231K.8 ; ref : 10 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-7108-6
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Evaluation performance Fabrication microélectronique Haute résolution Lithographie Matériau amorphe Photolithographie Photorésist Résist positif Stabilité thermique Température ambiante
Keyword (en)
Performance evaluation Microelectronic fabrication High resolution Lithography Amorphous material Photolithography Photoresist Positive resist Thermal stability Room temperature
Keyword (es)
Evaluación prestación Fabricación microeléctrica Alta resolucion Litografía Material amorfo Fotolitografía Fotorresistencia Resistencia positiva Estabilidad térmica Temperatura ambiente
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
20674152

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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