Molecular Contamination Control Technologies for High Volume Production in High NA 193-nm Lithography (Phase II)
- Author
- NAKANO, Toshiro1 ; TANAHASHI, Takashi1 ; IMAI, Akihiro1 ; YAMANA, Kazuki1 ; SHIMOTSU, Tainen1
[1] Nichias Corporation, 1-70 Daikokucyo, Tsurumiku, Yokohama-city, Kanagawa-ken, 230-0053, Japan - Conference title
- Advances in resist materials and processing technology XXV (25-27 February 2008, San Jose, California, USA)
- Conference name
- Advances in resist materials and processing technologies (25 ; San Jose CA 2008)
- Author (monograph)
- Henderson, Clifford L (Editor)
SPIE, United States (Organiser of meeting)
International SEMATECH (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692338.1-692338.12 ; ref : 6 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-7108-6
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Adsorption Charbon actif Composé organique Conception optimale Echange ion Fabrication microélectronique Lithographie UV Ouverture numérique Pastille électronique Petite dimension Photolithographie Production masse Rayonnement UV extrême Résist
- Keyword (en)
- Adsorption Activated carbon Organic compounds Optimal design Ion exchange Microelectronic fabrication UV lithography Numerical aperture Wafer Small dimension Photolithography Mass production Vacuum ultraviolet radiation Resist
- Keyword (es)
- Adsorción Carbón activado Compuesto orgánico Concepción optimal Cambio iónico Fabricación microeléctrica Litografía UV Abertura numérica Pastilla electrónica Pequeña dimensión Fotolitografía Producción en masa Radiación ultravioleta extrema Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20674196
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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