Patterning of narrow porous SiOCH trenches using a TiN hard mask
- Author
- DARNON, M1 ; CHEVOLLEAU, T1 ; TORRES, J3 ; EON, D1 ; BOUYSSOU, R1 ; PELISSIER, B1 ; VALLIER, L1 ; JOUBERT, O1 ; POSSEME, N2 ; DAVID, T2 ; BAILLY, F3
[1] LTM/CNRS, (CEA-LETI-Minatec), 17 rue des martyrs, 38054 Grenoble, France
[2] CEA-LETI-Minatec, 17 rue des martyrs, 38054 Grenoble, France
[3] STMicroelectronics, Central RεD, 850 ruεεJ. Monnet, 38926 Crolles, France - Source
Microelectronic engineering. 2008, Vol 85, Num 11, pp 2226-2235, 10 p ; ref : 28 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Hard mask Interconnects Low-k Patterning TiN
- Keyword (fr)
- Circuit intégré Contrainte compression Contrainte résiduelle Damasquinage Diélectrique basse permittivité Endommagement Fabrication microélectronique Gravure Interconnexion Lithographie Masque Matériau poreux Photolithographie Photorésist Polissage mécanochimique Taille critique Technologie tranchée
- Keyword (en)
- Integrated circuit Compressive stress Residual stress Damascene process Low k dielectric Damaging Microelectronic fabrication Engraving Interconnection Lithography Mask Porous material Photolithography Photoresist Chemical mechanical polishing Critical size Trench technology
- Keyword (es)
- Circuito integrado Tensión compresión Tensión residual Damasquinado Dieléctrico baja constante dieléctrica Deterioración Fabricación microeléctrica Grabado Interconexión Litografía Máscara Material poroso Fotolitografía Fotorresistencia Tecnología trinchera
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 20834595
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2008.06.025 
https://dx.doi.org/10.1016/j.mee.2008.06.025
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