Modified DLC coatings prepared in a large-scale reactor by dual microwave/pulsed-DC plasma-activated chemical vapour deposition
- Author
- CORBELLA, C1 ; BIALUCH, I1 ; KLEINSCHMIDT, M1 ; BEWILOGUA, K1
[1] Fraunhofer Institut für Schicht-und Oberflächentechnik, Bienroder Weg 54 E, 38108 Braunschweig, Germany - Conference title
- Proceedings of the 35th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), San Diego, California, April 28-May 2, 2008
- Conference name
- International Conference on Metallurgical Coatings and Thin Films (ICMCTF) (ICMCTF) (35 ; San Diego, California 2008-04-28)
- Author (monograph)
- PAULEAU, Yves (Editor); MAYRHOFER, Paul (Editor); ERDEMIR, Ali (Editor); INSPEKTOR, Aharon (Editor); RAMANATH, Ganapathiraman (Editor)
- Source
Thin solid films. 2008, Vol 517, Num 3, pp 1125-1130, 6 p ; ref : 19 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- ECR Microwaves Modified DLC PACVD Pulsed-DC Up scaling
- Keyword (fr)
- Acétylène Addition silicium Adhérence Angle contact Carbone adamantin Couche mince Dureté Décharge hyperfréquence Décharge luminescente Dépôt chimique phase vapeur Ionisation Loi échelle Matériau amorphe hydrogéné Monomère Procédé dépôt Propriété mécanique Précurseur Revêtement dur Revêtement protecteur Réacteur plasma Résonance cyclotronique électronique Sulfure de thulium Tribologie Usure Vitesse dépôt 5280H 6860B 8105U 8115G S Tm TmS a-C:H a-Si:H
- Keyword (en)
- Acetylene Silicon additions Adhesion Contact angle Diamond-like carbon Thin films Hardness Microwave discharge Glow discharges CVD Ionization Scaling laws Amorphous hydrogenated material Monomers Deposition process Mechanical properties Precursor Hard coating Protective coatings Plasma reactor Electron cyclotron-resonance Thulium sulfides Tribology Wear Deposition rate
- Keyword (es)
- Descarga hiperfrecuencia Procedimiento revestimiento Revestimiento duro Reactor plasma Velocidad deposición
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B80 Electric discharges / 001B50B80H Glow; corona
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60B Mechanical and acoustical properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21034294
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2008.07.017 
https://dx.doi.org/10.1016/j.tsf.2008.07.017
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