EUV lithography
- Author
- Bakshi, Vivek (Editor)
- Source
SPIE Press Monograph. ; EUV lithography. 2009, Vol 178 ; 1Vol ; xxvii, 673 p ; Illustration ; ref : Bibliographie en fin de chapitres
- ISBN
- 978-0-8194-6964-9 978-0-4704-7155-5
- Scientific domain
- Electronics
- Publisher
- SPIE Press, Bellingham WA
/
Wiley, Hoboken NJ
- Publication country
- United States
- Document type
- Book
- Language
- English
- Keyword (fr)
- Fabrication microélectronique Lithographie UV Photolithographie Rayonnement UV extrême
- Keyword (en)
- Microelectronic fabrication UV lithography Photolithography Vacuum ultraviolet radiation
- Keyword (es)
- Fabricación microeléctrica Litografía UV Fotolitografía Radiación ultravioleta extrema
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21163608
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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