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Investigations concerning the reaction silica/organosilane and organosilane/polymer. Part 1 : Reaction mechanism and reaction model for silica/organosilane

Author
HUNSCHE, A1 ; GÖRL, U1 ; MÜLLER, A2 ; KNAACK, M2 ; GÖBEL, T3
[1] Applied Technology department, Rubber Chemicals and Pigments Division, Degussa AG, Hürth-Kalscheuren, Germany
[2] Degussa's Central Research Facilities, Hanau-Wolfgang, Germany
[3] Degussa AG (Headquarters), Frankfurt, Germany
Conference name
International Rubber Conference IRC'97 (Nuremberg 1997-06-30)
Source

Kautschuk und Gummi, Kunststoffe. 1997, Vol 50, Num 12, pp 881-889 ; ref : 12 ref

CODEN
KGUKAC
ISSN
0022-9520
Scientific domain
Polymers, paint and wood industries
Publisher
Hüthig, Heidelberg
Publication country
Germany
Document type
Conference Paper
Language
English
Keyword (fr)
Condensation chimique Effet concentration Effet milieu Etat solide Etude expérimentale Matière charge Mécanisme réaction Silane organique Silice Spectrométrie RMN Sulfure organique
Keyword (en)
Condensation reaction Concentration effect Medium effect Solid state Experimental study Filler Reaction mechanism Organic silane Silica NMR spectrometry Organic sulfide
Keyword (es)
Condensación química Efecto concentración Efecto medio Estado sólido Estudio experimental Materia carga Mecanismo reacción Silano orgánico Sílice Espectrometría RMN Sulfuro orgánico
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A03 Compounding ingredients / 001D10A03A Fillers and reinforcing agents

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2128872

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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