Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method
- Author
- ANGHEL, A1 ; MUSTATA, I1 ; POROSNICU, C1 ; LUNGU, C. P1
[1] National Institute for Lasers, Plasma and Radiation Physics, NILPRP, Magurele-Bucharest 077125, Romania - Conference title
- Proceedings of the E-MRS 2008 Spring Meeting: Third Symposium N on Nuclear Materials
- Conference name
- Symposium N on Nuclear Materials (3 ; Strasbourg 2008-05-26)
- Author (monograph)
- DEGUELDRE, Claude (Editor)1 ; LEE, Bill (Editor)2 ; OVERSBY, Virginia (Editor)3 ; VAN WALLE, Eric (Editor)4
European Material Research Society (EMRS), Europe (Organiser of meeting)
[1] Paul Scherrer Institute, Villigen, Switzerland
[2] Imperial College, London, United Kingdom
[3] VMO Konsult, Stockholm, Sweden
[4] SCK, CEN, Mol, Belgium - Source
Journal of nuclear materials. 2009, Vol 385, Num 2, pp 242-245, 4 p ; ref : 8 ref
- CODEN
- JNUMAM
- ISSN
- 0022-3115
- Scientific domain
- Energy; Metallurgy, welding
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Béryllium Erreur systématique Inconel Microscopie électronique balayage Plasma ionique Première paroi Rugosité Réacteur fusion nucléaire Réacteur nucléaire Spectre photoélectron RX Spectrométrie Auger Surface libre
- Keyword (en)
- Beryllium Bias Inconel Scanning electron microscopy Ion plasma First wall Roughness Nuclear fusion reactor Nuclear reactor X-ray photoelectron spectra Auger electron spectrometry Free surface
- Keyword (es)
- Berilio Error sistemático Inconel Microscopía electrónica barrido Plasma iónico Rugosidad Reactor fusión nuclear Reactor nuclear Espectrometría Auger Superficie libre
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy / 001D06B Fuels / 001D06B04 Nuclear fuels
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy / 001D06D Energy. Thermal use of fuels / 001D06D04 Installations for energy generation and conversion: thermal and electrical energy. / 001D06D04D Fission nuclear power plants
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy / 001D06D Energy. Thermal use of fuels / 001D06D04 Installations for energy generation and conversion: thermal and electrical energy. / 001D06D04E Controled nuclear fusion plants
- Discipline
- Energy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21366711
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1016/j.jnucmat.2008.11.030 
https://dx.doi.org/10.1016/j.jnucmat.2008.11.030
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/j.jnucmat.2008.11.030\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:9:\"\u0000*\u0000jtitle\";s:28:\"Journal of nuclear materials\";s:9:\"\u0000*\u0000stitle\";s:14:\"J. nucl. mater\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"385\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"242\";s:8:\"\u0000*\u0000epage\";s:3:\"245\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0022-3115\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"ANGHEL\";s:10:\"\u0000*\u0000aufirst\";s:1:\"A\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"MUSTATA, I\";i:1;s:12:\"POROSNICU, C\";i:2;s:11:\"LUNGU, C. P\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JNUMAM\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:84:\"Proceedings of the E-MRS 2008 Spring Meeting: Third Symposium N on Nuclear Materials\";s:8:\"\u0000*\u0000title\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/j.jnucmat.2008.11.030\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:9:\"\u0000*\u0000jtitle\";s:28:\"Journal of nuclear materials\";s:9:\"\u0000*\u0000stitle\";s:14:\"J. nucl. mater\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"385\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"242\";s:8:\"\u0000*\u0000epage\";s:3:\"245\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0022-3115\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"ANGHEL\";s:10:\"\u0000*\u0000aufirst\";s:1:\"A\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"MUSTATA, I\";i:1;s:12:\"POROSNICU, C\";i:2;s:11:\"LUNGU, C. P\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JNUMAM\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:84:\"Proceedings of the E-MRS 2008 Spring Meeting: Third Symposium N on Nuclear Materials\";s:8:\"\u0000*\u0000title\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/j.jnucmat.2008.11.030\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/j.jnucmat.2008.11.030\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:9:\"\u0000*\u0000jtitle\";s:28:\"Journal of nuclear materials\";s:9:\"\u0000*\u0000stitle\";s:14:\"J. nucl. mater\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"385\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"242\";s:8:\"\u0000*\u0000epage\";s:3:\"245\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0022-3115\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"ANGHEL\";s:10:\"\u0000*\u0000aufirst\";s:1:\"A\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"MUSTATA, I\";i:1;s:12:\"POROSNICU, C\";i:2;s:11:\"LUNGU, C. P\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JNUMAM\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:84:\"Proceedings of the E-MRS 2008 Spring Meeting: Third Symposium N on Nuclear Materials\";s:8:\"\u0000*\u0000title\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/j.jnucmat.2008.11.030\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:9:\"\u0000*\u0000jtitle\";s:28:\"Journal of nuclear materials\";s:9:\"\u0000*\u0000stitle\";s:14:\"J. nucl. mater\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"385\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"242\";s:8:\"\u0000*\u0000epage\";s:3:\"245\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0022-3115\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"ANGHEL\";s:10:\"\u0000*\u0000aufirst\";s:1:\"A\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"MUSTATA, I\";i:1;s:12:\"POROSNICU, C\";i:2;s:11:\"LUNGU, C. P\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JNUMAM\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:84:\"Proceedings of the E-MRS 2008 Spring Meeting: Third Symposium N on Nuclear Materials\";s:8:\"\u0000*\u0000title\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:29:\"10.1016\/j.jnucmat.2008.11.030\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:9:\"\u0000*\u0000jtitle\";s:28:\"Journal of nuclear materials\";s:9:\"\u0000*\u0000stitle\";s:14:\"J. nucl. mater\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"385\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"242\";s:8:\"\u0000*\u0000epage\";s:3:\"245\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0022-3115\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"ANGHEL\";s:10:\"\u0000*\u0000aufirst\";s:1:\"A\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"MUSTATA, I\";i:1;s:12:\"POROSNICU, C\";i:2;s:11:\"LUNGU, C. P\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JNUMAM\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:84:\"Proceedings of the E-MRS 2008 Spring Meeting: Third Symposium N on Nuclear Materials\";s:8:\"\u0000*\u0000title\";s:99:\"Influence of the bias voltage on the formation of beryllium films by a thermionic vacuum arc method\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
