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Polarized angular dependence of out-of-plane light-scattering measurements for nanoparticles on wafer

Author
LIU, Cheng-Yang1 ; FU, Wei-En1
[1] Center for Measurement Standards, Industrial Technology Research Institute, 321 Kuang Fu Road Sec. 2, Hsinchu 300, Taiwan, Province of China
Source

Optics communications. 2009, Vol 282, Num 11, pp 2097-2103, 7 p ; ref : 30 ref

CODEN
OPCOB8
ISSN
0030-4018
Scientific domain
Electronics; Optics; Telecommunications
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
42.62.Cf 42.68.Mj 68.49.-h Bidirectional ellipsometry Light-scattering measurement Nanoparticles
Keyword (fr)
Contamination superficielle Diffusion lumière Ellipsométrie Méthode mesure Méthode optique Nanoparticule Polarisation optique Silicium 0760F 4225F
Keyword (en)
Surface contamination Light scattering Ellipsometry Measuring methods Optical method Nanoparticles Optical polarization Silicon
Keyword (es)
Método óptico
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G60 Optical instruments, equipment and techniques / 001B00G60F Polarimeters and ellipsometers

Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B25 Wave optics / 001B40B25F Diffraction and scattering

Discipline
Metrology Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
21378766

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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