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Laser-induced fluorescence detection of SiF2 as a primary product of Si and SiO2 reactive ion etching with CF4 gas

Author
CUNGE, G1 ; CHABERT, P1 2 3 ; BOOTH, J.-P1
[1] Laboratoire de Spectrométrie Physique, Université J Fourier-Grenoble, BP 87, 38402 St Martin d'Hères, France
[2] Laboratoire PRIAM-ONERA, 91761 Palaiseau, France
[3] Thomson-CSF/LCR, Domaine de Corbeville, 91404 Orsay, France
Conference title
Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases
Conference name
Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (Poprad, High Tatras 1996-08-27)
Source

Plasma sources science & technology (Print). 1997, Vol 6, Num 3, pp 349-360 ; ref : 43 ref

ISSN
0963-0252
Scientific domain
Plasma physics
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Conference Paper
Language
English
Keyword (fr)
Chimie plasma Détecteur fluorescence Etude expérimentale Gravure ionique réactive Hydrocarbure fluoré Laser UV Mélange gaz
Keyword (en)
Plasma chemistry Fluorescence detector Experimental study Reactive ion etching Fluorocarbon Ultraviolet laser Gas mixtures
Keyword (es)
Química plasma Detector fluorescencia Grabado iónico reactivo Hidrocarburo fluorado Laser UV
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B30 Atomic and molecular physics / 001B30B Atomic properties and interactions with photons / 001B30B50 Fluorescence, phosphorescence (including quenching)

Pascal
001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pacs
3250 Fluorescence, phosphorescence (including quenching)

Pacs
8165C Surface cleaning, etching, patterning

Discipline
Atomic and molecular physics Physics and materials science Physics of gases, plasmas and electric discharges
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2167582

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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