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Thermally activated dislocation depinning at a grain boundary in nanocrystalline and ultrafine-grained materials

Author
KATO, Masaharu1
[1] Department of Materials Science and Engineering, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-J2-60 Ngatsuta-cho, Midori-ku, Yokohama 226-8502, Japan
Source

Materials science & engineering. A, Structural materials : properties, microstructure and processing. 2009, Vol 516, Num 1-2, pp 276-282, 7 p ; ref : 48 ref

ISSN
0921-5093
Scientific domain
Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
Dislocations Nanocrystalline materials Thermally activated process Ultrafine grained materials Yield strength
Keyword (fr)
Ancrage dislocation Energie activation Joint grain Limite élasticité Nanocristal Sensibilité vitesse déformation Structure grain fin Vitesse déformation Volume activation
Keyword (en)
Dislocation pinning Activation energy Grain boundaries Yield strength Nanocrystal Strain rate sensitivity Fine grain structure Strain rate Activation volume
Keyword (es)
Nanocristal Sensibilidad velocidad deformación Estructura grano fino Volumen activación
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A72 Defects and impurities in crystals; microstructure / 001B60A72H Indirect evidence of dislocations and other defects (resistivity, slip, creep, strains, internal friction, epr, nmr, etc.)

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
21731673

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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