Influences of process parameters and mold geometry on direct nanoimprint
- Author
- YAO, C. H1 ; HSIUNG, H. Y1 ; SUNG, C. K1
[1] Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan, Province of China - Conference title
- MNE'08. The 34th International Conference on Micro- and Nano-Engineering (MNE)
- Conference name
- International Conference on Micro- and Nano-Engineering (MNE) (MNE) (34 ; Athens 2008-09-15)
- Author (monograph)
- RAPTIS, Ioannis (Editor)1 ; GOGOLIDES, Evangelos (Editor)1
[1] Institute of Microelectronics, NCSR 'Demokritos', Greece - Source
Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 665-668, 4 p ; ref : 9 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Direct nanoimprint Metallic pattern Mold geometry Process parameters
- Keyword (fr)
- Couche mince métallique Diminution coût Echelle nanométrique Fabrication microélectronique Formation motif Largeur raie Matériau revêtu Microscopie force atomique Microscopie électronique balayage Microscopie électronique transmission Nanolithographie Nanostructure Pastille électronique Procédé fabrication Topographie surface 0779
- Keyword (en)
- Metallic thin films Cost lowering Nanometer scale Microelectronic fabrication Patterning Line width Coated material Atomic force microscopy Scanning electron microscopy Transmission electron microscopy Nanolithography Nanostructure Wafer Manufacturing process Surface topography
- Keyword (es)
- Reducción costes Fabricación microeléctrica Formacíon motivo Anchura raya espectral Material revestido Microscopía fuerza atómica Microscopía electrónica barrido Microscopía electrónica transmisión Nanoestructura Pastilla electrónica Procedimiento fabricación
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21799623
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2008.11.056 
https://dx.doi.org/10.1016/j.mee.2008.11.056
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