Integration of EUV lithography in the fabrication of 22-nm node devices
- Author
- WOOD, Obert1 ; KOAY, Chiew-Seng2 ; LA FONTAINE, Bruno5 ; OKOROANYANWU, Uzodinma1 ; TCHIKOULAEVA, Anna6 ; WALLOW, Tom5 ; CHEN, James H.-C2 ; COLBUM, Matthew2 ; FAN, Susan S.-C2 ; HARAN, Bala S2 ; YUNPENG YIN2 ; PETRILLO, Karen2 ; MIZUNO, Hiroyuki3 ; RAGHUNATHAN, Sudhar1 ; ARNOLD, John2 ; HORAK, Dave2 ; BURKHARDT, Martin4 ; MCINTYRE, Gregory2 ; YUNFEI DENG5
[1] Advanced Micro Devices, 257 Fuller Road, Albany, NY 12203, United States
[2] IBM Corporation, 257 Fuller Road, Albany, NY 12203, United States
[3] Toshiba America Electronic Components, 257 Fuller Road, Albany, NY 12203, United States
[4] IBM Corporation, 2070 Route 52, Hopewell Junction, NY 12533, United States
[5] Advanced Micro Devices, One AMD Place, Sunnyvale, CA 94088, United States
[6] AMD Saxony LLC & Co. KG, Wilschdorfer Landstrasse 101, 01109 Dresden, Germany - Conference title
- Alternative lithographic technologies (24-26 February 2009, San Jose, California, United States)
- Conference name
- Alternative lithographic technologies (San Jose CA 2009)
- Author (monograph)
- Schellenberg, F. M (Editor); La Fontaine, Bruno M (Editor)
SPIE, United States (Organiser of meeting)
International SEMATECH (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7271 ; 727104.1-727104.10 ; 2 ; ref : 22 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-7524-4 0-8194-7524-6
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Circuit intégré Evaluation performance Fabrication microélectronique Formation motif Imagerie Imageur Interconnexion Lithographie UV Lithographie Masque Méthode immersion Pastille électronique Photolithographie Polissage Rayonnement UV extrême Resist Scanneur Système expert 0130C 4282C 8540 8540H 8560H
- Keyword (en)
- Integrated circuits Performance evaluation Microelectronic fabrication Patterning Imagery Imager Interconnections Ultraviolet lithography Lithography Masks Immersion method Wafers Photolithography Polishing Extreme ultraviolet radiation Resists Scanner Expert systems
- Keyword (es)
- Fabricación microeléctrica Imaginería Imager Método immersión Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides
- Discipline
- Electronics Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21882173
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.814379 
https://dx.doi.org/10.1117/12.814379
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