Effect of H2 dilution on a-CN:H films deposited by hot-wire chemical vapor deposition
- Author
- SWAIN, Bibhu P1 ; SWAIN, Bhabani S1 ; HWANG, Nong M1
[1] National Research Laboratory of Charged Nanoparticles, Department of Materials Science and Engineering, Seoul National University, Seoul, Korea, Republic of - Source
Applied surface science. 2009, Vol 255, Num 22, pp 9264-9267, 4 p ; ref : 23 ref
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- HWCVD Valence band XPS a-CN:H
- Keyword (fr)
- Bande valence Croissance film Dépôt chimique phase vapeur Fil chaud Spectre photoélectron RX
- Keyword (en)
- Valence bands Film growth CVD Hot wire X-ray photoelectron spectra
- Keyword (es)
- Hilo caliente
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21896435
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.apsusc.2009.07.020 
https://dx.doi.org/10.1016/j.apsusc.2009.07.020
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