Electromagnetic field distributions in waveguide-based axial-type microwave plasma source
- Author
- NOWAKOWSKA, H1 ; JASINSKI, M1 ; MIZERACZYK, J1 2
[1] Centre for Plasma and Laser Engineering, The Szewalski Institute of Fluid-Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-952 Gdańsk, Poland
[2] Dept. of Marine Electronics, Gdynia Maritime University, Morska 83, 81-225 Gdynia, Poland - Issue title
- Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane
- Author (monograph)
- SCHÄFER, J1 ; FOEST, R1 ; QUADE, A1 ; OHL, A1 ; MEICHSNER, J2 ; WELTMANN, K. D1
[1] INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany
[2] Ernst-Moritz-Arndt University Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany - Source
The European physical journal. D, Atomic, molecular and optical physics (Print). 2009, Vol 54, Num 2, pp 511-518, 8 p ; ref : 25 ref
- ISSN
- 1434-6060
- Scientific domain
- Optics; Atomic molecular physics
- Publisher
- EDP Sciences, Les Ulis
- Publication country
- France
- Document type
- Article
- Language
- English
- Keyword (fr)
- Densité électron Distribution champ Effet peau Guide onde Génération plasma Hydrogène Ligne coaxiale Logiciel Méthane Onde stationnaire Optimisation Physique plasma Plasma hyperfréquence Source plasma 5225 5250D 8440A Paramètre plasma
- Keyword (en)
- Electron density Field distribution Skin effect Waveguides Plasma generation Hydrogen Coaxial line Computer software Methane Standing waves Optimization Plasma physics Microwave plasma Plasma sources Plasma parameter
- Keyword (es)
- Distribución campo Generación plasma Línea coaxial
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B25 Plasma properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B50 Plasma production and heating / 001B50B50D Plasma sources
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02B Microwave circuits, microwave integrated circuits, microwave transmission lines, submillimeter wave circuits
- Discipline
- Electronics Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21934425
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1140/epjd/e2008-00259-y 
https://dx.doi.org/10.1140/epjd/e2008-00259-y
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:26:\"10.1140\/epjd\/e2008-00259-y\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:9:\"\u0000*\u0000jtitle\";s:79:\"The European physical journal. D, Atomic, molecular and optical physics (Print)\";s:9:\"\u0000*\u0000stitle\";s:35:\"Eur. phys. j., D At. mol. opt. phys\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"54\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"511\";s:8:\"\u0000*\u0000epage\";s:3:\"518\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1434-6060\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"NOWAKOWSKA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:11:\"JASINSKI, M\";i:1;s:13:\"MIZERACZYK, J\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:66:\"Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane\";s:8:\"\u0000*\u0000title\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP Sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:26:\"10.1140\/epjd\/e2008-00259-y\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:9:\"\u0000*\u0000jtitle\";s:79:\"The European physical journal. D, Atomic, molecular and optical physics (Print)\";s:9:\"\u0000*\u0000stitle\";s:35:\"Eur. phys. j., D At. mol. opt. phys\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"54\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"511\";s:8:\"\u0000*\u0000epage\";s:3:\"518\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1434-6060\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"NOWAKOWSKA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:11:\"JASINSKI, M\";i:1;s:13:\"MIZERACZYK, J\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:66:\"Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane\";s:8:\"\u0000*\u0000title\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP Sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:26:\"10.1140\/epjd\/e2008-00259-y\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:26:\"10.1140\/epjd\/e2008-00259-y\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:9:\"\u0000*\u0000jtitle\";s:79:\"The European physical journal. D, Atomic, molecular and optical physics (Print)\";s:9:\"\u0000*\u0000stitle\";s:35:\"Eur. phys. j., D At. mol. opt. phys\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"54\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"511\";s:8:\"\u0000*\u0000epage\";s:3:\"518\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1434-6060\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"NOWAKOWSKA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:11:\"JASINSKI, M\";i:1;s:13:\"MIZERACZYK, J\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:66:\"Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane\";s:8:\"\u0000*\u0000title\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP Sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:26:\"10.1140\/epjd\/e2008-00259-y\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:9:\"\u0000*\u0000jtitle\";s:79:\"The European physical journal. D, Atomic, molecular and optical physics (Print)\";s:9:\"\u0000*\u0000stitle\";s:35:\"Eur. phys. j., D At. mol. opt. phys\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"54\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"511\";s:8:\"\u0000*\u0000epage\";s:3:\"518\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1434-6060\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"NOWAKOWSKA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:11:\"JASINSKI, M\";i:1;s:13:\"MIZERACZYK, J\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:66:\"Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane\";s:8:\"\u0000*\u0000title\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP Sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:26:\"10.1140\/epjd\/e2008-00259-y\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:9:\"\u0000*\u0000jtitle\";s:79:\"The European physical journal. D, Atomic, molecular and optical physics (Print)\";s:9:\"\u0000*\u0000stitle\";s:35:\"Eur. phys. j., D At. mol. opt. phys\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"54\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"511\";s:8:\"\u0000*\u0000epage\";s:3:\"518\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1434-6060\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"NOWAKOWSKA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:11:\"JASINSKI, M\";i:1;s:13:\"MIZERACZYK, J\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:66:\"Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane\";s:8:\"\u0000*\u0000title\";s:89:\"Electromagnetic field distributions in waveguide-based axial-type microwave plasma source\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP Sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"8\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
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