Measurement of the Vertical Nonuniformity of the Plasma Sheath in a Complex Plasma
- Autor
- JIE KONG1 ; HYDE, Truell W1 ; HARRIS, Brandon1 ; KE QIAO1 ; CARMONA-REYES, Jorge1
[1] Center for Astrophysics, Space Physics and Engineering Research, Baylor University, Waco, TX 76798, United States - Fuente
IEEE transactions on plasma science. 2009, Vol 37, Num 8, pp 1620-1625, 6 p ; 2 ; ref : 21 ref
- CODEN
- ITPSBD
- ISSN
- 0093-3813
- Campo Científico
- Nuclear physics; Plasma physics
- Editor
- Institute of Electrical and Electronics Engineers, New York, NY
- País de la publicación
- United States
- Tipo de documento
- Article
- Idioma
- English
- Palabra clave de autor
- Anisotropic effects complex plasma diagnostics ion wakefield plasma sheath
- Palabra clave (fr)
- Donnée expérimentale Etude expérimentale Gaine plasma Plasma complexe Plasma poussiéreux 5227L 5240K
- Palabra clave (in)
- Experimental data Experimental study Plasma sheaths Complex plasma Dusty plasmas
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B27 Basic studies of specific kinds of plasmas / 001B50B27L Dusty or complex plasmas ; plasma crystals
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B40 Plasma interactions (nonlaser) / 001B50B40K Plasma sheaths
- Disciplina
- Physics of gases, plasmas and electric discharges
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 21969259
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1109/TPS.2009.2024943 
https://dx.doi.org/10.1109/TPS.2009.2024943
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