SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008
- Author
- JIANG, Weihua (Editor)
1 ; WEBER, Bruce (Editor)
2 ; MANKOWSKI, John (Editor)
3
[1] Department of Electrical Engineering, Tsinghua University, 100084 Beijing, China
[2] Naval Research Laboratory, Washington, DC 20375, United States
[3] Department of Electrical and Computer Engineering, Texas Tech University, Lubbock, TX 79404, United States - Conference name
- International Conference on High-Power Particle Beams (BEAMS) (BEAMS) (17 ; Xi'an 2008-07-07)
- Source
IEEE transactions on plasma science. 2009, Vol 37, Num 10, 135 p. ; 1 ; ref : dissem
- CODEN
- ITPSBD
- ISSN
- 0093-3813
- Scientific domain
- Nuclear physics; Plasma physics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Conference Proceedings
- Language
- English
- Keyword (fr)
- Application Faisceau particule Hyperfréquence Simulation numérique Technologie puissance impulsionnelle 0777
- Keyword (en)
- Application Particle beams Microwave radiation Digital simulation Pulsed power technology
- Keyword (es)
- Aplicación
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G77 Atomic, molecular and charged-particle sources and detectors
- Discipline
- Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21972318
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1109/TPS.2009.2029080 
https://dx.doi.org/10.1109/TPS.2009.2029080
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"conference\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2009.2029080\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:0:\"\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:2:\"10\";s:8:\"\u0000*\u0000spage\";s:0:\"\";s:8:\"\u0000*\u0000epage\";s:0:\"\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:5:\"JIANG\";s:10:\"\u0000*\u0000aufirst\";s:6:\"Weihua\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:12:\"WEBER, Bruce\";i:1;s:15:\"MANKOWSKI, John\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:10:\"conference\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000title\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:1:\"1\";s:9:\"\u0000*\u0000tpages\";s:3:\"135\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"conference\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2009.2029080\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:0:\"\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:2:\"10\";s:8:\"\u0000*\u0000spage\";s:0:\"\";s:8:\"\u0000*\u0000epage\";s:0:\"\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:5:\"JIANG\";s:10:\"\u0000*\u0000aufirst\";s:6:\"Weihua\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:12:\"WEBER, Bruce\";i:1;s:15:\"MANKOWSKI, John\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:10:\"conference\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000title\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:1:\"1\";s:9:\"\u0000*\u0000tpages\";s:3:\"135\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2009.2029080\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"conference\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2009.2029080\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:0:\"\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:2:\"10\";s:8:\"\u0000*\u0000spage\";s:0:\"\";s:8:\"\u0000*\u0000epage\";s:0:\"\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:5:\"JIANG\";s:10:\"\u0000*\u0000aufirst\";s:6:\"Weihua\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:12:\"WEBER, Bruce\";i:1;s:15:\"MANKOWSKI, John\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:10:\"conference\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000title\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:1:\"1\";s:9:\"\u0000*\u0000tpages\";s:3:\"135\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"conference\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2009.2029080\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:0:\"\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:2:\"10\";s:8:\"\u0000*\u0000spage\";s:0:\"\";s:8:\"\u0000*\u0000epage\";s:0:\"\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:5:\"JIANG\";s:10:\"\u0000*\u0000aufirst\";s:6:\"Weihua\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:12:\"WEBER, Bruce\";i:1;s:15:\"MANKOWSKI, John\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:10:\"conference\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000title\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:1:\"1\";s:9:\"\u0000*\u0000tpages\";s:3:\"135\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"conference\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2009.2029080\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:0:\"\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:2:\"10\";s:8:\"\u0000*\u0000spage\";s:0:\"\";s:8:\"\u0000*\u0000epage\";s:0:\"\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:5:\"JIANG\";s:10:\"\u0000*\u0000aufirst\";s:6:\"Weihua\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:12:\"WEBER, Bruce\";i:1;s:15:\"MANKOWSKI, John\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:10:\"conference\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000title\";s:49:\"SPECIAL ISSUE FOR SELECTED PAPERS FROM BEAMS 2008\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:1:\"1\";s:9:\"\u0000*\u0000tpages\";s:3:\"135\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
