Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition
- Author
- CHUN HUANG1 ; HSU, Wen-Tung2 ; LIU, Chi-Hung2 ; WU, Shin-Yi1 ; YANG, Shih-Hsien2 ; CHEN, Tai-Hung2 ; WEI, Ta-Chin3
[1] Department of Chemical Engineering and Materials Science, Yuan Ze Fuel Cell Center, Yuan Ze University, Chung-Li 32003, Taiwan, Province of China
[2] Mechanical and Systems Research Laboratories, Industrial Technology Research Institute, Hsinchu 310, Taiwan, Province of China
[3] Department of Chemical Engineering, R & D Center for Membrane Technology, Chung Yuan University, Chungli 320, Taiwan, Province of China - Issue title
- Special Issue on Plasma-Based Surface Modification and Treatment Technologies
- Author (monograph)
- CHU, Paul K (Editor)1 ; YUKIMURA, Ken (Editor)2 ; XIUBO TIAN (Editor)3
[1] Department of Physics and Materials Science, City University of Hong Kong, Hong-Kong
[2] Department of Electrical Engineering, Doshisha University, Kyoto 610-0321, Japan
[3] School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China - Source
IEEE transactions on plasma science. 2009, Vol 37, Num 7, pp 1127-1128, 2 p ; 1 ; ref : 7 ref
- CODEN
- ITPSBD
- ISSN
- 0093-3813
- Scientific domain
- Nuclear physics; Plasma physics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Author keyword
- Atmospheric-pressure-plasma jet (APPJ) plasma CVD plasma applications plasma devices
- Keyword (fr)
- Application plasma Argon Basse température Couche mince Dispositif plasma Génération plasma Jet plasma Méthode PECVD Plasma froid Pression atmosphérique Revêtement Source plasma 5250D 5275 5277D
- Keyword (en)
- Plasma applications Argon Low temperature Thin films Plasma devices Plasma generation Plasma jets PECVD Cold plasma Atmospheric pressure Coatings Plasma sources
- Keyword (es)
- Baja temperatura Generación plasma
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B50 Plasma production and heating / 001B50B50D Plasma sources
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B75 Plasma devices
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77D Plasma-based ion implantation and deposition
- Discipline
- Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21975818
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1109/TPS.2008.2011636 
https://dx.doi.org/10.1109/TPS.2008.2011636
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2008.2011636\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:4:\"1127\";s:8:\"\u0000*\u0000epage\";s:4:\"1128\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"CHUN HUANG\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:6:{i:0;s:13:\"HSU, Wen-Tung\";i:1;s:13:\"LIU, Chi-Hung\";i:2;s:11:\"WU, Shin-Yi\";i:3;s:16:\"YANG, Shih-Hsien\";i:4;s:14:\"CHEN, Tai-Hung\";i:5;s:12:\"WEI, Ta-Chin\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:77:\"Special Issue on Plasma-Based Surface Modification and Treatment Technologies\";s:8:\"\u0000*\u0000title\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"2\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2008.2011636\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:4:\"1127\";s:8:\"\u0000*\u0000epage\";s:4:\"1128\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"CHUN HUANG\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:6:{i:0;s:13:\"HSU, Wen-Tung\";i:1;s:13:\"LIU, Chi-Hung\";i:2;s:11:\"WU, Shin-Yi\";i:3;s:16:\"YANG, Shih-Hsien\";i:4;s:14:\"CHEN, Tai-Hung\";i:5;s:12:\"WEI, Ta-Chin\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:77:\"Special Issue on Plasma-Based Surface Modification and Treatment Technologies\";s:8:\"\u0000*\u0000title\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"2\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2008.2011636\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2008.2011636\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:4:\"1127\";s:8:\"\u0000*\u0000epage\";s:4:\"1128\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"CHUN HUANG\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:6:{i:0;s:13:\"HSU, Wen-Tung\";i:1;s:13:\"LIU, Chi-Hung\";i:2;s:11:\"WU, Shin-Yi\";i:3;s:16:\"YANG, Shih-Hsien\";i:4;s:14:\"CHEN, Tai-Hung\";i:5;s:12:\"WEI, Ta-Chin\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:77:\"Special Issue on Plasma-Based Surface Modification and Treatment Technologies\";s:8:\"\u0000*\u0000title\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"2\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2008.2011636\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:4:\"1127\";s:8:\"\u0000*\u0000epage\";s:4:\"1128\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"CHUN HUANG\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:6:{i:0;s:13:\"HSU, Wen-Tung\";i:1;s:13:\"LIU, Chi-Hung\";i:2;s:11:\"WU, Shin-Yi\";i:3;s:16:\"YANG, Shih-Hsien\";i:4;s:14:\"CHEN, Tai-Hung\";i:5;s:12:\"WEI, Ta-Chin\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:77:\"Special Issue on Plasma-Based Surface Modification and Treatment Technologies\";s:8:\"\u0000*\u0000title\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"2\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2008.2011636\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:2:\"37\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:4:\"1127\";s:8:\"\u0000*\u0000epage\";s:4:\"1128\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"CHUN HUANG\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:6:{i:0;s:13:\"HSU, Wen-Tung\";i:1;s:13:\"LIU, Chi-Hung\";i:2;s:11:\"WU, Shin-Yi\";i:3;s:16:\"YANG, Shih-Hsien\";i:4;s:14:\"CHEN, Tai-Hung\";i:5;s:12:\"WEI, Ta-Chin\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:77:\"Special Issue on Plasma-Based Surface Modification and Treatment Technologies\";s:8:\"\u0000*\u0000title\";s:72:\"Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"2\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
