Development of Y-Shaped Filtered-Arc-Deposition System for Preparing Multielement Composition-Controlled Film
- Author
- TANOUE, Hideto1 ; HIKOSAKA, Hiroki2 ; YASUI, Haruyuki7 ; MASHIKI, Takayuki1 ; OKE, Shinichiro1 ; SUDA, Yoshiyuki1 ; TAKIKAWA, Hirofumi1 ; HASEGAWA, Yushi3 ; TAKI, Makoto3 ; KAMIYA, Masao4 5 ; ISHIKAWA, Takeshi6
[1] Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Toyohashi 441-8580, Japan
[2] Mitsubishi Electric Corporation, Nagoya 100-8310, Japan
[3] Development Division, Onward Ceramic Coating Company, Ltd., Nomi 929-0111, Japan
[4] Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Toyohashi 441-8580, Japan
[5] Department of Technology Development, Itoh Optical Industrial Company, Ltd., Gamagori 443-0041, Japan
[6] Tottori University, Tottori 680-8550, Japan, and also with the Fundamental Technology Research Center, Hitachi Tool Engineering, Ltd., Narita 286-0825, Japan
[7] Department of Machinery and Metal, Industrial Research Institute of Ishikawa, Kanazawa 929-8203, Japan - Issue title
- Special Issue on Plasma-Based Surface Modification and Treatment Technologies
- Author (monograph)
- CHU, Paul K (Editor)1 ; YUKIMURA, Ken (Editor)2 ; XIUBO TIAN (Editor)3
[1] Department of Physics and Materials Science, City University of Hong Kong, Hong-Kong
[2] Department of Electrical Engineering, Doshisha University, Kyoto 610-0321, Japan
[3] School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China - Source
IEEE transactions on plasma science. 2009, Vol 37, Num 7, pp 1140-1145, 6 p ; 1 ; ref : 18 ref
- CODEN
- ITPSBD
- ISSN
- 0093-3813
- Scientific domain
- Nuclear physics; Plasma physics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Author keyword
- Y-shaped filtered arc deposition (Y-FAD) current ratio duct bias multielement film titanium-aluminum (Ti-Al) film
- Keyword (fr)
- Accord fréquence Arc sous vide Conception Dépôt plasma Phénomène transport plasma Propriété transport Titane 5225F 5277D
- Keyword (en)
- Tuning Vacuum arcs Design Plasma deposition Plasma transport processes Transport properties Titanium
- Keyword (es)
- Propiedad transporte
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B25 Plasma properties / 001B50B25F Transport properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77D Plasma-based ion implantation and deposition
- Discipline
- Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 21975821
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1109/TPS.2009.2014765 
https://dx.doi.org/10.1109/TPS.2009.2014765
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