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Influence of tertiarybutylphosphine (TBP) addition on the CVD growth of diamond

Author
FRANGIEH, G1 ; JOMARD, F1 ; PINAULT, M.-A1 ; BARJON, J1
[1] Groupe d'Etude de la Matière Condensée (GEMaC), Université Versailles St Quentin, CNRS, 1 place Aristide Briand, 92195 Meudon, France
Conference name
Hasselt Diamond Workshop (Hasselt 2009-03-02)
Source

Physica status solidi. A, Applications and materials science (Print). 2009, Vol 206, Num 9, pp 1996-1999, 4 p ; ref : 12 ref

ISSN
1862-6300
Scientific domain
Crystallography; Electronics; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Wiley-VCH, Berlin
Publication country
Germany
Document type
Conference Paper
Language
English
Keyword (fr)
Addition phosphore Anisotropie Diamant Dopage Dépôt chimique phase vapeur Facettage Germination secondaire Hyperfréquence Microscopie électronique balayage Mécanisme croissance Polycristal Précurseur Semiconducteur type n Spectre SIMS Taux croissance Si
Keyword (en)
Phosphorus additions Anisotropy Diamonds Doping CVD Faceting Secondary nucleation Microwave radiation Scanning electron microscopy Growth mechanism Polycrystals Precursor n type semiconductor Secondary ion mass spectra Growth rate
Keyword (es)
Doping Facetage Germinación secundaria Mecanismo crecimiento
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
21979486

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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