Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature
- Autor
- FIGUEIREDO, V1 ; ELANGOVAN, E1 ; GONCALVES, G1 ; FRANCO, N2 ; ALVES, E2 ; PARK, S. H. K3 ; MARTINS, R1 ; FORTUNATO, E1
[1] Materials Science Department, CENIMAT-I3N and CEMOP-UNINOVA, FCT-UNL, Campus da Caparica, 2829-516 Caparica, Portugal
[2] LFI, Dep. Física, Instituto Tecnológico e Nuclear, EN10, 2686-953 Sacavém, Portugal
[3] Basic Research Laboratory, Electronics and Telecommunications Research Institute, Transparent Electronics Team, Yusong-gu, Daejeon 305-350, Korea, Republic of - Nombre de la conferencia
- Flexible and Transparent Electronics: From Materials to Devices. Symposium (Warsaw 2008-09-15)
- Fuente
Physica status solidi. A, Applications and materials science (Print). 2009, Vol 206, Num 9, pp 2143-2148, 6 p ; ref : 24 ref
- ISSN
- 1862-6300
- Campo Científico
- Crystallography; Electronics; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
- Editor
- Wiley-VCH, Berlin
- País de la publicación
- Germany
- Tipo de documento
- Conference Paper
- Idioma
- English
- Palabra clave (fr)
- Bande interdite Coefficient absorption Conductivité électrique Couche mince Diffraction RX Effet température Energie activation Evaporation faisceau électronique Microstructure Oxyde de cuivre Paramètre cristallin Recuit Réseau cubique Semiconducteur Spectre absorption Cu2O
- Palabra clave (in)
- Energy gap Absorption coefficients Electrical conductivity Thin films XRD Temperature effects Activation energy Electron beam evaporation Microstructure Copper oxide Lattice parameters Annealing Cubic lattices Semiconductor materials Absorption spectra
- Palabra clave (es)
- Cobre óxido
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C61 Electrical properties of specific thin films / 001B70C61L Other inorganic semiconductors
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films / 001B70H66L Other semiconductors
- Disciplina
- Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 21979514
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1002/pssa.200881797 
https://dx.doi.org/10.1002/pssa.200881797
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:22:\"10.1002\/pssa.200881797\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:9:\"\u0000*\u0000jtitle\";s:68:\"Physica status solidi. A, Applications and materials science (Print)\";s:9:\"\u0000*\u0000stitle\";s:48:\"Phys. status solidi, A Appl. mater. sci. (Print)\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"206\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"2143\";s:8:\"\u0000*\u0000epage\";s:4:\"2148\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1862-6300\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"FIGUEIREDO\";s:10:\"\u0000*\u0000aufirst\";s:1:\"V\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"ELANGOVAN, E\";i:1;s:12:\"GONCALVES, G\";i:2;s:9:\"FRANCO, N\";i:3;s:8:\"ALVES, E\";i:4;s:13:\"PARK, S. H. K\";i:5;s:10:\"MARTINS, R\";i:6;s:12:\"FORTUNATO, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:8:\"\u0000*\u0000place\";s:6:\"Berlin\";s:6:\"\u0000*\u0000pub\";s:9:\"Wiley-VCH\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Panist
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:22:\"10.1002\/pssa.200881797\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:9:\"\u0000*\u0000jtitle\";s:68:\"Physica status solidi. A, Applications and materials science (Print)\";s:9:\"\u0000*\u0000stitle\";s:48:\"Phys. status solidi, A Appl. mater. sci. (Print)\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"206\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"2143\";s:8:\"\u0000*\u0000epage\";s:4:\"2148\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1862-6300\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"FIGUEIREDO\";s:10:\"\u0000*\u0000aufirst\";s:1:\"V\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"ELANGOVAN, E\";i:1;s:12:\"GONCALVES, G\";i:2;s:9:\"FRANCO, N\";i:3;s:8:\"ALVES, E\";i:4;s:13:\"PARK, S. H. K\";i:5;s:10:\"MARTINS, R\";i:6;s:12:\"FORTUNATO, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:8:\"\u0000*\u0000place\";s:6:\"Berlin\";s:6:\"\u0000*\u0000pub\";s:9:\"Wiley-VCH\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Istex
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:22:\"10.1002\/pssa.200881797\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Acceso mediante Unpaywall
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:22:\"10.1002\/pssa.200881797\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:9:\"\u0000*\u0000jtitle\";s:68:\"Physica status solidi. A, Applications and materials science (Print)\";s:9:\"\u0000*\u0000stitle\";s:48:\"Phys. status solidi, A Appl. mater. sci. (Print)\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"206\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"2143\";s:8:\"\u0000*\u0000epage\";s:4:\"2148\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1862-6300\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"FIGUEIREDO\";s:10:\"\u0000*\u0000aufirst\";s:1:\"V\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"ELANGOVAN, E\";i:1;s:12:\"GONCALVES, G\";i:2;s:9:\"FRANCO, N\";i:3;s:8:\"ALVES, E\";i:4;s:13:\"PARK, S. H. K\";i:5;s:10:\"MARTINS, R\";i:6;s:12:\"FORTUNATO, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:8:\"\u0000*\u0000place\";s:6:\"Berlin\";s:6:\"\u0000*\u0000pub\";s:9:\"Wiley-VCH\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Europe PubMed Central
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:22:\"10.1002\/pssa.200881797\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:9:\"\u0000*\u0000jtitle\";s:68:\"Physica status solidi. A, Applications and materials science (Print)\";s:9:\"\u0000*\u0000stitle\";s:48:\"Phys. status solidi, A Appl. mater. sci. (Print)\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"206\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"2143\";s:8:\"\u0000*\u0000epage\";s:4:\"2148\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1862-6300\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"FIGUEIREDO\";s:10:\"\u0000*\u0000aufirst\";s:1:\"V\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"ELANGOVAN, E\";i:1;s:12:\"GONCALVES, G\";i:2;s:9:\"FRANCO, N\";i:3;s:8:\"ALVES, E\";i:4;s:13:\"PARK, S. H. K\";i:5;s:10:\"MARTINS, R\";i:6;s:12:\"FORTUNATO, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:8:\"\u0000*\u0000place\";s:6:\"Berlin\";s:6:\"\u0000*\u0000pub\";s:9:\"Wiley-VCH\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Base Search
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:22:\"10.1002\/pssa.200881797\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:9:\"\u0000*\u0000jtitle\";s:68:\"Physica status solidi. A, Applications and materials science (Print)\";s:9:\"\u0000*\u0000stitle\";s:48:\"Phys. status solidi, A Appl. mater. sci. (Print)\";s:7:\"\u0000*\u0000date\";s:4:\"2009\";s:9:\"\u0000*\u0000volume\";s:3:\"206\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"2143\";s:8:\"\u0000*\u0000epage\";s:4:\"2148\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1862-6300\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:10:\"FIGUEIREDO\";s:10:\"\u0000*\u0000aufirst\";s:1:\"V\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"ELANGOVAN, E\";i:1;s:12:\"GONCALVES, G\";i:2;s:9:\"FRANCO, N\";i:3;s:8:\"ALVES, E\";i:4;s:13:\"PARK, S. H. K\";i:5;s:10:\"MARTINS, R\";i:6;s:12:\"FORTUNATO, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:132:\"Electrical, structural and optical applicate characterization of copper oxide thin films as a function of post annealing temperature\";s:8:\"\u0000*\u0000place\";s:6:\"Berlin\";s:6:\"\u0000*\u0000pub\";s:9:\"Wiley-VCH\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante arXiv
