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Importance of sunscreen products spreading protocol and substrate roughness for in vitro sun protection factor assessment

Author
FAGEON, L1 ; MOYAL, D1 ; COUTET, J1 ; CANDAU, D1
[1] L'Oreal, Research & Development Center, 188, rue Paul Hochart, 94550 Chevilly-Larue, France
Source

International journal of cosmetic science. 2009, Vol 31, Num 6, pp 405-417, 13 p ; ref : 11 ref

CODEN
IJCMDW
ISSN
0142-5463
Scientific domain
Chemical industry parachemical industry
Publisher
Wiley, Malden, MA
Publication country
United States
Document type
Article
Language
English
Author keyword
in vitro SPF spreading sunscreen products surface roughness
Keyword (fr)
Article synthèse Corrélation Cosmétique Emulsion eau huile Etalement Huile paraffinique In vitro In vivo Indice protection Méthacrylate de méthyle polymère Produit antisolaire Propriété surface Prétraitement Rugosité Substrat Traitement surface
Keyword (en)
Review Correlation Cosmetic Water oil emulsion Spreading Paraffinic oil In vitro In vivo Sun protection factor Methyl methacrylate polymer Sunscreen product Surface properties Pretreatment Roughness Substrate Surface treatment
Keyword (es)
Artículo síntesis Correlación Cosmético Emulsión agua aceite Escalonamiento Aceite parafénico In vitro In vivo Indice protección Metacrilato de metilo polímero Producto antisolar Propiedad superficie Pretratamiento Rugosidad Substrato Tratamiento superficie
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D08 Chemical industry and chemicals / 001D08D Washing products. Cosmetics and toiletries. Perfumes / 001D08D02 Cosmetics, toiletries

Discipline
Chemical and parachemical industries
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22036832

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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