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Effect of RF-plasma deposition parameters on the composition and properties of organic layers deposited on glass fibers

Author
BALKOVA, R1 ; JANCAR, J1 ; CECH, V1
[1] Institute of Materials Chemistry, Brno University of Technology, 118 Purkynova, 61200 Brno, Czech Republic
Source

Composites science and technology. 2009, Vol 69, Num 14, pp 2485-2490, 6 p ; ref : 16 ref

CODEN
CSTCEH
ISSN
0266-3538
Scientific domain
Chemical industry parachemical industry; Mechanics acoustics; Metallurgy, welding; Polymers, paint and wood industries
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
A. Coupling agents A. Glass fibers B. Fiber/matrix bond C. Stress transfer
Keyword (fr)
Adhésivité Composé vinylique Dépôt plasma Ester polymère Etude expérimentale Fibre minérale Fibre verre Interface fibre matrice Méthode PECVD Plasma froid Polymère réticulé Polymère silicium Propriété interface Relation mise en oeuvre propriété Relation mise en oeuvre structure Silane organique Structure moléculaire Traitement surface
Keyword (en)
Adhesivity Vinylic compound Plasma deposition Ester polymer Experimental study Mineral fiber Glass fiber Matrix fiber interface PECVD Cold plasma Crosslinked polymer Silicon polymer Interface properties Property processing relationship Structure processing relationship Organic silane Molecular structure Surface treatment
Keyword (es)
Adhesividad Compuesto vinílico Depósito plasma Ester polímero Estudio experimental Fibra inorgánica Fibra vidrio Interfase fibra matriz Plasma frío Polímero reticulado Polímero silicio Propiedad interfase Relación puesta en marcha propiedad Relación puesta en marcha estructura Silano orgánico Estructura molecular Tratamiento superficie
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A06 Forms of application and semi-finished materials / 001D10A06H Composites

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22058668

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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